Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 中科院强激光材料重点实验室

	Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation
	Xu, Cheng ; Ma, Ming ; Sun, Huanhuan ; Lin, Di ; Feng, Peizhong ; Qi, Jianwei ; Qiang, Yinghuai ; Li, Dawei ; Tao, Chunxian
刊名	optoelectron. adv. mater.-rapid commun.
	2015
卷号	9 期号:42686 页码:1337
通讯作者	xu, c (reprint author), china univ min & technol, sch mat sci & engn, xuzhou 221116, peoples r china.
英文摘要	ta2o5 films were prepared by electron beam evaporation under different oxygen partial pressures. three ta2o5 models were constructed according to the experimental obtained o/ta ratios to calculate the microscopic properties. it was shown that the oxygen vacancy significantly decreased the microscopic band gaps, which was due to the generation of a defect level in the energy gap formed by 5d state of tantalum. the lidt shared the same trend with the microscopic band gaps. with the increase of the o/ta ratios from 2.44 and 2.47 to 2.50, the lidt increased by 62.2% and 54.7%, whereas the microscopic band gaps increased by 268% and 160%, respectively, compared to the initial value.
收录类别	SCI
语种	英语
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/13830]
专题	上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位	1.[Xu, Cheng 2.Ma, Ming 3.Sun, Huanhuan 4.Lin, Di 5.Feng, Peizhong 6.Qi, Jianwei 7.Qiang, Yinghuai] China Univ Min & Technol, Sch Mat Sci & Engn, Xuzhou 221116, Peoples R China 8.[Li, Dawei 9.Tao, Chunxian] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab High Power Laser Mat, Shanghai 201800, Peoples R China 10.Univ Shanghai Sci & Technol, Sch Opt Elect & Comp Engn, Shanghai 200093, Peoples R China
推荐引用方式 GB/T 7714	Xu, Cheng,Ma, Ming,Sun, Huanhuan,et al. Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation[J]. optoelectron. adv. mater.-rapid commun.,2015,9(42686):1337.
APA	Xu, Cheng.,Ma, Ming.,Sun, Huanhuan.,Lin, Di.,Feng, Peizhong.,...&Tao, Chunxian.(2015).Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation.optoelectron. adv. mater.-rapid commun.,9(42686),1337.
MLA	Xu, Cheng,et al."Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation".optoelectron. adv. mater.-rapid commun. 9.42686(2015):1337.