Design and simulation of double annular illumination mode for micro-lithography

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	Design and simulation of double annular illumination mode for micro-lithography
	Song, Qiang ; Zhu, Jing ; Yang, Baoxi ; Liu, Lei ; Wang, Jun ; Huang, Huijie
	2013
会议名称	5th international symposium on photoelectronic detection and imaging (ispdi) - micro/nano optical imaging technologies and applications
通讯作者	yang, bx (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china.
英文摘要	methods of generating various illumination patterns remain as an attractive and important micro-optics research area for the development of resolution enhancement in advanced lithography system. in the current illumination system of lithography machine, off-axis illumination is widely used as an effective approach to enhance the resolution and increase the depth of focus (dof). this paper proposes a novel illumination mode generation unit, which transform conventional mode to double annular shaped radial polarized (darp) mode for improving the resolution of micro-lithography. through lighttools (tm) software simulation, double annular shaped mode is obtained from the proposed generation unit. the mathematical expressions of the radius variation of inner and outer rings are deduced. the impacts of conventional and dual concentric annular illumination pattern on critical dimension uniformity were simulated on an isolated line, square hole and corner. lithography performance was compared between darp illumination mode and corresponding single annular modes under critical dimension of 45nm. as a result, darp illumination mode can improve the uniformity of aerial image at 45nm node through pitch varied in 300-500 nm to a certain extent.
收录类别	CPCI
会议录	international symposium on photoelectronic detection and imaging 2013: micro/nano optical imaging technologies and applications
会议录出版者	spie-int soc optical engineering
语种	英语
内容类型	会议论文
源URL	[http://ir.siom.ac.cn/handle/181231/17262]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	1.[Song, Qiang 2.Zhu, Jing 3.Yang, Baoxi 4.Liu, Lei 5.Wang, Jun 6.Huang, Huijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China
推荐引用方式 GB/T 7714	Song, Qiang,Zhu, Jing,Yang, Baoxi,et al. Design and simulation of double annular illumination mode for micro-lithography[C]. 见:5th international symposium on photoelectronic detection and imaging (ispdi) - micro/nano optical imaging technologies and applications.