Pitch Evaluation of High-precision Gratings
Lu, Yancong; Zhou, Changhe; Wei, Chunlong; Jia, Wei; Xiang, Xiansong; Li, Yanyang; Yu, Junjie; Li, Shubin; Wang, Jin; Liu, Kun
2014
会议名称conference on holography, diffractive optics, and applications vi
通讯作者lu, yc (reprint author), chinese acad sci, shanghai inst opt & fine mech, 390 qinghe rd, shanghai 201800, peoples r china.
英文摘要optical encoders and laser interferometers are two primary solutions in nanometer metrology. as the precision of encoders depends on the uniformity of grating pitches, it is essential to evaluate pitches accurately. we use a ccd image sensor to acquire grating image for evaluating the pitches with high precision. digital image correlation technique is applied to filter out the noises. we propose three methods for determining the pitches of grating with peak positions of correlation coefficients. numerical simulation indicated the average of pitch deviations from the true pitch and the pitch variations are less than 0.02 pixel and 0.1 pixel for these three methods when the ideal grating image is added with salt and pepper noise, speckle noise, and gaussian noise. experimental results demonstrated that our method can measure the pitch of the grating accurately, for example, our home-made grating with 20 mu m period has 475nm peak-to-valley uniformity with 40nm standard deviation during 35mm range. another measurement illustrated that our home- made grating has 40nm peak-to-valley uniformity with 10nm standard deviation. this work verified that our lab can fabricate high-accuracy gratings which should be interesting for practical application in optical encoders.
收录类别CPCI
会议录holography, diffractive optics, and applications vi
会议录出版者spie-int soc optical engineering
语种英语
内容类型会议论文
源URL[http://ir.siom.ac.cn/handle/181231/17228]  
专题上海光学精密机械研究所_信息光学与光电技术实验室
作者单位1.[Lu, Yancong
2.Zhou, Changhe
3.Wei, Chunlong
4.Jia, Wei
5.Xiang, Xiansong
6.Li, Yanyang
7.Yu, Junjie
8.Li, Shubin
9.Wang, Jin
10.Liu, Kun
推荐引用方式
GB/T 7714
Lu, Yancong,Zhou, Changhe,Wei, Chunlong,et al. Pitch Evaluation of High-precision Gratings[C]. 见:conference on holography, diffractive optics, and applications vi.
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