Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 强场激光物理国家重点实验室

	Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation
	Yu, Zhenkun ; He, Hongbo ; He, Kai ; Qi, Hongji ; Wei, Sun ; Chen, Shunli
刊名	optik
	2014
卷号	125 期号:18 页码:5323
关键词	Thin film Laser-induced damage Ultraviolet laser irradiation
通讯作者	he, hb (reprint author), shanghai inst opt & fine mech, key lab mat high power laser, 390 qinghe rd, shanghai, peoples r china.
英文摘要	high reflectivity coating is designed and fabricated with hfo2/sio2 stacks. the laser-induced damage experiment is prepared by a third-order harmonic generation of nd:yag laser (355 nm, 8 ns). typical damage micrographs are obtained using atomic force microscope (afm) and scanning electron microscope (sem). a theoretical model based on the thermal transfer is tried to describe the defect dependence of damage morphology. three situations are considered in this model: single defect, couple defects and high absorption film. the calculated results show that the second situation agrees well with the experiment. (c) 2014 elsevier gmbh. all rights reserved.
收录类别	SCI
语种	英语
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/13638]
专题	上海光学精密机械研究所_强场激光物理国家重点实验室
作者单位	1.[Yu, Zhenkun 2.He, Hongbo 3.He, Kai 4.Qi, Hongji 5.Wei, Sun 6.Chen, Shunli] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China 7.[Yu, Zhenkun 8.He, Kai 9.Wei, Sun 10.Chen, Shunli] Chinese Acad Sci, Grad Sch, Beijing, Peoples R Ch
推荐引用方式 GB/T 7714	Yu, Zhenkun,He, Hongbo,He, Kai,et al. Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation[J]. optik,2014,125(18):5323.
APA	Yu, Zhenkun,He, Hongbo,He, Kai,Qi, Hongji,Wei, Sun,&Chen, Shunli.(2014).Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation.optik,125(18),5323.
MLA	Yu, Zhenkun,et al."Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation".optik 125.18(2014):5323.