Fabrication of resonant subwavelength grating based on thiol-ene | |
Zhang, Man; Deng, Qiling; Shi, Lifang; Li, Zhiwei; Pang, Hui; Zhang, Yukun; Yu, Jinqing; Hu, Song | |
2014 | |
会议名称 | Proceedings of SPIE: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design Manufacturing, and Testing of Micro- and Nano-Optical Devices, and Systems |
会议日期 | 2014 |
卷号 | 9283 |
页码 | 92830R |
通讯作者 | Deng, Qiling |
中文摘要 | This paper presents an approach used to fabricate resonant subwavelength grating based on thiol-ene material. First of all, polydimethylsiloxane soft imprint stamp with opposite structure of the subwavelength grating master mold is made by casting. Then, the desired subwavelength grating with UV-curable thiol-ene material grating structure is fabricated using the polydimethylsioxane soft stamp by UV-curable soft-lithography. Here, we fabricate a subwavelength grating with period of 300nm using the approach, which could reflect blue light with wavelength ranging from 448nm to 482nm at a specific angle and presents the excellent resonant characteristic. The experimental results are consistent with the simulation results, demonstrating that the approach proposed in this paper could effectively fabricate the thiol-ene material resonant subwavelength grating structure. The thiol-ene material is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. The fabrication technique in this paper is simple, low-cost, and easy to high throughput, which has broad application prospects in the preparation of micro and nano structures. © 2014 SPIE. |
英文摘要 | This paper presents an approach used to fabricate resonant subwavelength grating based on thiol-ene material. First of all, polydimethylsiloxane soft imprint stamp with opposite structure of the subwavelength grating master mold is made by casting. Then, the desired subwavelength grating with UV-curable thiol-ene material grating structure is fabricated using the polydimethylsioxane soft stamp by UV-curable soft-lithography. Here, we fabricate a subwavelength grating with period of 300nm using the approach, which could reflect blue light with wavelength ranging from 448nm to 482nm at a specific angle and presents the excellent resonant characteristic. The experimental results are consistent with the simulation results, demonstrating that the approach proposed in this paper could effectively fabricate the thiol-ene material resonant subwavelength grating structure. The thiol-ene material is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. The fabrication technique in this paper is simple, low-cost, and easy to high throughput, which has broad application prospects in the preparation of micro and nano structures. © 2014 SPIE. |
收录类别 | EI |
学科主题 | Casting - Curing - Diffraction gratings - Fabrication - Manufacture - Molds - Nanostructures - Optical devices - Organic polymers - Silicones |
语种 | 英语 |
ISSN号 | 0277786X |
内容类型 | 会议论文 |
源URL | [http://ir.ioe.ac.cn/handle/181551/7666] |
专题 | 光电技术研究所_微电子装备总体研究室(四室) |
作者单位 | Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China |
推荐引用方式 GB/T 7714 | Zhang, Man,Deng, Qiling,Shi, Lifang,et al. Fabrication of resonant subwavelength grating based on thiol-ene[C]. 见:Proceedings of SPIE: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design Manufacturing, and Testing of Micro- and Nano-Optical Devices, and Systems. 2014. |
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