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	The next generation microelectronics craft technique: Nanoimprint lithography
	Wei, Jiang1; Nan, Wang1; Wei, Yan2; Song, Hu1; Xiao-Qiong, Pu1
	2013
会议名称	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings
会议日期	2013
页码	337-342
中文摘要	Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its developmen, including the principle, applications and challenges. © 2013 IEEE.
英文摘要	Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its developmen, including the principle, applications and challenges. © 2013 IEEE.
收录类别	EI
学科主题	Manufacture - Microelectronics - Nanotechnology - Photolithography - Semiconductor device manufacture - Technology
语种	英语
内容类型	会议论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7658]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China 2.Dept. of Industrial Design Engineering, Sichuan University, Chengdu, 610065, China
推荐引用方式 GB/T 7714	Wei, Jiang,Nan, Wang,Wei, Yan,et al. The next generation microelectronics craft technique: Nanoimprint lithography[C]. 见:2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings. 2013.

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