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	Influence of Collimation on Alignment Accuracy in Proximity Lithography
	Wang, Nan; Jiang, Wei; Zhu, Jiangping; Tang, Yan; Yan, Wei; Tong, Junmin; Hu, Song
刊名	IEEE PHOTONICS JOURNAL
	2014
卷号	6期号:4
ISSN号	1943-0655
通讯作者	Wang, N (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China.
中文摘要	The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.
英文摘要	The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.
学科主题	Collimation; moire fringe; lithography alignment
收录类别	SCI
语种	英语
WOS记录号	WOS:000342912700013
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7291]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.[Wang, Nan 2.Jiang, Wei 3.Tang, Yan 4.Yan, Wei 5.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China 6.[Wang, Nan] Univ Chinese Acad Sci, Beijing 100039, Peoples R China 7.[Zhu, Jiangping] Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China 8.[Tong, Junmin] Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China
推荐引用方式 GB/T 7714	Wang, Nan,Jiang, Wei,Zhu, Jiangping,et al. Influence of Collimation on Alignment Accuracy in Proximity Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(4).
APA	Wang, Nan.,Jiang, Wei.,Zhu, Jiangping.,Tang, Yan.,Yan, Wei.,...&Hu, Song.(2014).Influence of Collimation on Alignment Accuracy in Proximity Lithography.IEEE PHOTONICS JOURNAL,6(4).
MLA	Wang, Nan,et al."Influence of Collimation on Alignment Accuracy in Proximity Lithography".IEEE PHOTONICS JOURNAL 6.4(2014).

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