Electronic transport characterization of silicon wafers by spatially resolved steady-state photocarrier radiometric imaging
Wang, Qian1,2; Li, Bincheng1,3
刊名Journal of Applied Physics
2015
卷号118期号:12页码:125705
ISSN号0021-8979
通讯作者Li, Bincheng
中文摘要Spatially resolved steady-state photocarrier radiometric (PCR) imaging technique is developed to characterize the electronic transport properties of silicon wafers. Based on a nonlinear PCR theory, simulations are performed to investigate the effects of electronic transport parameters (the carrier lifetime, the carrier diffusion coefficient, and the front surface recombination velocity) on the steady-state PCR intensity profiles. The electronic transport parameters of an n-type silicon wafer are simultaneously determined by fitting the measured steady-state PCR intensity profiles to the three-dimensional nonlinear PCR model. The determined transport parameters are in good agreement with the results obtained by the conventional modulated PCR technique with multiple pump beam radii. © 2015 AIP Publishing LLC.
英文摘要Spatially resolved steady-state photocarrier radiometric (PCR) imaging technique is developed to characterize the electronic transport properties of silicon wafers. Based on a nonlinear PCR theory, simulations are performed to investigate the effects of electronic transport parameters (the carrier lifetime, the carrier diffusion coefficient, and the front surface recombination velocity) on the steady-state PCR intensity profiles. The electronic transport parameters of an n-type silicon wafer are simultaneously determined by fitting the measured steady-state PCR intensity profiles to the three-dimensional nonlinear PCR model. The determined transport parameters are in good agreement with the results obtained by the conventional modulated PCR technique with multiple pump beam radii. © 2015 AIP Publishing LLC.
学科主题Carrier lifetime - Imaging techniques - Photoelectricity - Polymerase chain reaction - Radiometry - Semiconducting silicon - Silicon
收录类别SCI ; EI
语种英语
WOS记录号WOS:000362565800075
内容类型期刊论文
源URL[http://ir.ioe.ac.cn/handle/181551/6639]  
专题光电技术研究所_薄膜光学技术研究室(十一室)
作者单位1.Institute of Optics and Electronics, Chinese Academy of Sciences, P. O. Box 350, Shuangliu, Chengdu, China
2.University of the Chinese Academy of Sciences, Beijing, China
3.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu, China
推荐引用方式
GB/T 7714
Wang, Qian,Li, Bincheng. Electronic transport characterization of silicon wafers by spatially resolved steady-state photocarrier radiometric imaging[J]. Journal of Applied Physics,2015,118(12):125705.
APA Wang, Qian,&Li, Bincheng.(2015).Electronic transport characterization of silicon wafers by spatially resolved steady-state photocarrier radiometric imaging.Journal of Applied Physics,118(12),125705.
MLA Wang, Qian,et al."Electronic transport characterization of silicon wafers by spatially resolved steady-state photocarrier radiometric imaging".Journal of Applied Physics 118.12(2015):125705.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace