Self-assembled SiGe quantum rings grown on Si(001) by molecular beam epitaxy | |
Cui, J; He Q(贺庆); Jiang XM(姜晓明); He, Q; Jiang, XM; Fan, YL; Yang, XJ; Xue, F; Jiang, ZM | |
刊名 | APPLIED PHYSICS LETTERS |
2003 | |
卷号 | 83期号:14页码:2907-2909 |
通讯作者 | Fudan Univ, Surface Phys Lab, Natl Key Lab, Shanghai 200433, Peoples R China ; Inst High Energy Phys, BSRF, Beijing 100039, Peoples R China |
英文摘要 | SiGe quantum rings (QRs) were grown by partially capping on Ge quantum dots (QDs) on Si(001). Atomic force microscopy images show the shape transformation from QDs to QRs. Initial capping, with a Si layer thickness less than 2 nm, will result in the decrease of height of QDs and increase of base diameter of QDs. Capped with a Si layer, QDs will change into QRs. The mechanism of transformation from QDs to QRs is discussed. The strain will redistribute after capping, thus the strain energy relief, together with high Ge surface diffusion and Ge surface segregation at a relative high temperature of 680 degreesC, play the dominant role. (C) 2003 American Institute of Physics. |
学科主题 | Physics |
类目[WOS] | Physics, Applied |
研究领域[WOS] | Physics |
原文出处 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000185664000059 |
内容类型 | 期刊论文 |
源URL | [http://ir.ihep.ac.cn/handle/311005/239841] |
专题 | 高能物理研究所_多学科研究中心 |
作者单位 | 中国科学院高能物理研究所 |
推荐引用方式 GB/T 7714 | Cui, J,He Q,Jiang XM,et al. Self-assembled SiGe quantum rings grown on Si(001) by molecular beam epitaxy[J]. APPLIED PHYSICS LETTERS,2003,83(14):2907-2909. |
APA | Cui, J.,贺庆.,姜晓明.,He, Q.,Jiang, XM.,...&Jiang, ZM.(2003).Self-assembled SiGe quantum rings grown on Si(001) by molecular beam epitaxy.APPLIED PHYSICS LETTERS,83(14),2907-2909. |
MLA | Cui, J,et al."Self-assembled SiGe quantum rings grown on Si(001) by molecular beam epitaxy".APPLIED PHYSICS LETTERS 83.14(2003):2907-2909. |
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