Phase transition of Graphitic-C3N4 under high pressure by in situ resistance measurement in a diamond anvil cell
Han, YH; Luo, JF; Gao, CX; Ma, HA; Hao, AM; Li, YC; Li, XD; Liu, J; Li, M; Liu, HW
刊名CHINESE PHYSICS LETTERS
2005
卷号22期号:6页码:1347-1349
通讯作者Jilin Univ, Inst Atom & Mol Phys, State Key Lab Superhard Mat, Changchun 130012, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing Synchrotron Radiat Lab, Beijing 100039, Peoples R China
英文摘要In situ resistance measurement of Graphitic-C3N4 has been performed under high pressure in a diamond anvil cell. The result reveals that there are changes of electron transport behaviour. As the pressure increases from ambient to 30 GPa, three abnormal resistance changes can be found at room temperature and two are found at 77 K. The abnormal resistance dropped at 5 GPa is close to the phase transition pressure from the P (6) over bar m2 structure to the p structure predicted by Lowther et al. [Phys. Rev. B 59 (1999) 11683] Another abnormal change of resistance at 12 GPa is related to the phase transition from g-C3N4 to cubic-C3N4 [Teter and Hemley, Science 271 (1996) 53].
学科主题Physics
类目[WOS]Physics, Multidisciplinary
研究领域[WOS]Physics
原文出处SCI
语种英语
WOS记录号WOS:000229738700014
内容类型期刊论文
源URL[http://ir.ihep.ac.cn/handle/311005/239306]  
专题高能物理研究所_多学科研究中心
中国科学院高能物理研究所_科研计划处
作者单位中国科学院高能物理研究所
推荐引用方式
GB/T 7714
Han, YH,Luo, JF,Gao, CX,et al. Phase transition of Graphitic-C3N4 under high pressure by in situ resistance measurement in a diamond anvil cell[J]. CHINESE PHYSICS LETTERS,2005,22(6):1347-1349.
APA Han, YH.,Luo, JF.,Gao, CX.,Ma, HA.,Hao, AM.,...&刘景.(2005).Phase transition of Graphitic-C3N4 under high pressure by in situ resistance measurement in a diamond anvil cell.CHINESE PHYSICS LETTERS,22(6),1347-1349.
MLA Han, YH,et al."Phase transition of Graphitic-C3N4 under high pressure by in situ resistance measurement in a diamond anvil cell".CHINESE PHYSICS LETTERS 22.6(2005):1347-1349.
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