Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts

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	Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts
	Ren, Wenfeng 1,2; Wang, Yanhong 1; Zhang, Zailei 1; Tan, Qiangqiang 1; Zhong, Ziyi 3; Su, Fabing 1
刊名	APPLIED SURFACE SCIENCE
	2016
卷号	360 期号:JAN 页码:192-197
关键词	Si wafers Direct-pattern Rochow reaction Copper catalysts CH3Cl
ISSN号	0169-4332
英文摘要	Despite the promising application of patterned Si wafers (PSWs) in electrochemistry and photochemistry, the simple and environment-friendly fabrication of these PSWs is still a great challenge. Herein, we report a novel method for fabrication of PSWs via Rochow reaction, which is commonly used to produce organosilane monomers for synthesizing organosilane products in chemical industry. In this reaction, commercial Si wafers (SWs) reacted with gas CH3Cl over patterned various Cu-based catalyst to create regular patterns. PSWs were obtained after removal of Cu compounds followed with facile post treatment. Because of simplicity, low-cost and low-toxicity of this approach, the manufacture of PSWs on an industrial scale is highly possible, which can be realized by integrating the organosilane synthesis process and controlling the reaction conditions. (C) 2015 Elsevier B.V. All rights reserved.
WOS标题词	Science & Technology ; Physical Sciences ; Technology
类目[WOS]	Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]	Chemistry ; Materials Science ; Physics
关键词[WOS]	SOLAR-CELLS ; FABRICATION ; NANOWIRES ; LITHOGRAPHY ; LITHIUM ; SYSTEM ; ARRAYS ; MASK
收录类别	SCI
语种	英语
WOS记录号	WOS:000366591200024
内容类型	期刊论文
源URL	[http://ir.ipe.ac.cn/handle/122111/20180]
专题	过程工程研究所_多相复杂系统国家重点实验室
作者单位	1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.ASTAR, Inst Chem Engn & Sci, Jurong Isl 627833, Singapore
推荐引用方式 GB/T 7714	Ren, Wenfeng,Wang, Yanhong,Zhang, Zailei,et al. Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts[J]. APPLIED SURFACE SCIENCE,2016,360(JAN):192-197.
APA	Ren, Wenfeng,Wang, Yanhong,Zhang, Zailei,Tan, Qiangqiang,Zhong, Ziyi,&Su, Fabing.(2016).Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts.APPLIED SURFACE SCIENCE,360(JAN),192-197.
MLA	Ren, Wenfeng,et al."Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts".APPLIED SURFACE SCIENCE 360.JAN(2016):192-197.