Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes

	Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes
	Zhuo Xiong ; Tongbo Wei ; Yonghui Zhang ; Junxi Wang ; Jinmin Li
刊名	optics express
	2015
卷号	24 期号:2 页码:a44-a51
学科主题	半导体器件
收录类别	SCI
语种	英语
公开日期	2016-04-15
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/27006]
专题	半导体研究所_中科院半导体照明研发中心
推荐引用方式 GB/T 7714	Zhuo Xiong,Tongbo Wei,Yonghui Zhang,et al. Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes[J]. optics express,2015,24(2):a44-a51.
APA	Zhuo Xiong,Tongbo Wei,Yonghui Zhang,Junxi Wang,&Jinmin Li.(2015).Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes.optics express,24(2),a44-a51.
MLA	Zhuo Xiong,et al."Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes".optics express 24.2(2015):a44-a51.