Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors
Jin Peng; Xu Bo
刊名半导体学报
2005
卷号26期号:8页码:1519-1523
中文摘要the wet oxidation of algaas with high al content in a distributed bragg reflectors (dbr) is studied by scanning electron microscopy (sem) and transmission electron microscopy (tem). some voids distribute along the oxide/gaas interfaces due to the stress induced by the wet oxidation of the algaas layers. these voids decrease the shrinkage of the al2o3 layers to 8% instead of the theoretical 20% when compared to the unoxidized algaas layers. with the extension of oxidation time, the reactants are more completely transported to the front interface and the products are more completely transported out along the porous interfaces. as a result,the oxide quality is better.
学科主题半导体材料
收录类别CSCD
资助信息国家重点基础研究发展计划,国家自然科学基金
语种英语
公开日期2010-11-23
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/16923]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Jin Peng,Xu Bo. Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors[J]. 半导体学报,2005,26(8):1519-1523.
APA Jin Peng,&Xu Bo.(2005).Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors.半导体学报,26(8),1519-1523.
MLA Jin Peng,et al."Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors".半导体学报 26.8(2005):1519-1523.
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