Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography

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	Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography
	Luo, Jun 1; Zeng, Bo 1; Wang, Changtao 1; Gao, Ping 1; Liu, Kaipeng 1; Pu, Mingbo 1; Jin, Jinjin 1; Zhao, Zeyu 1; Li, Xiong 1; Yu, Honglin 2
刊名	NANOSCALE
	2015
卷号	7 期号:44 页码:18805-18812
ISSN号	2040-3364
英文摘要	Nanofabrication technology with high-resolution, high-throughput and low-cost is essential for the development of nanoplasmonic and nanophotonic devices. At present, most metasurfaces are fabricated in a point by point writing manner with electron beam lithography or a focused ion beam, which imposes a serious cost barrier with respect to practical applications. Near field optical lithography, seemingly providing a high-resolution and low-cost way, however, suffers from the ultra shallow depth and poor fidelity of obtained photoresist patterns due to the exponential decay feature of evanescent waves. Here, we propose a method of surface plasmonic imaging lithography by introducing a reflective plasmonic lens to amplify and compensate evanescent waves, resulting in the production of nano resist patterns with high fidelity, contrast and enhanced depth beyond that usually obtained by near field optical lithography. As examples, a discrete and anisotropically arrayed nano-slots mask pattern with different orientations and a size of 40 nm x 120 nm could be imaged in photoresist and transferred successfully onto a metal layer through an etching process. Evidence for the pattern quality is given by virtue of the fabricated meta-surface lens devices showing good focusing performance in experiments. It is believed that this method provides a parallel, low-cost, high-throughput and large-area nanofabrication route for fabricating nano-structures of holograms, vortex phase plates, bio-sensors and solar cells etc.
WOS标题词	Science & Technology ; Physical Sciences ; Technology
类目[WOS]	Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
研究领域[WOS]	Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
关键词[WOS]	EVANESCENT NEAR-FIELD ; OPTICAL LITHOGRAPHY ; SILVER SUPERLENS ; VISIBLE-LIGHT ; REFRACTION ; SURFACE ; POLARITONS
收录类别	SCI
语种	英语
WOS记录号	WOS:000364824000050
公开日期	2016-02-26
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/3769]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China 2.Chongqing Univ, Key Lab Optoelect Technol & Syst, Minist Educ, Chongqing 400030, Peoples R China
推荐引用方式 GB/T 7714	Luo, Jun,Zeng, Bo,Wang, Changtao,et al. Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography[J]. NANOSCALE,2015,7(44):18805-18812.
APA	Luo, Jun.,Zeng, Bo.,Wang, Changtao.,Gao, Ping.,Liu, Kaipeng.,...&Luo, Xiangang.(2015).Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography.NANOSCALE,7(44),18805-18812.
MLA	Luo, Jun,et al."Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography".NANOSCALE 7.44(2015):18805-18812.