DETERMINATION OF SURFACE-ROUGHNESS OF INP (001) WAFERS BY X-RAY-SCATTERING

CORC > 半导体研究所 > 中国科学院半导体研究所 > 中国科学院半导体研究所（2009年前）

	DETERMINATION OF SURFACE-ROUGHNESS OF INP (001) WAFERS BY X-RAY-SCATTERING
	CUI SF ; LI JH ; LI M ; LI CR ; GU YS ; MAI ZH ; WANG YT ; ZHUANG Y
刊名	journal of applied physics
	1994
卷号	76 期号:7 页码:4154-4158
关键词	REFLECTIVITY DIFFRACTION
ISSN号	0021-8979
通讯作者	cui sf chinese acad sciinst physbeijing 100080peoples r china
中文摘要	the surface roughness of polished inp (001) wafers were examined by x-ray reflectivity and crystal truncation rod (ctr) measurements. the root-mean-square roughness and the lateral correlation scale were obtained by both methods. the scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. a simple surface model of surface faceting is proposed to explain the experimental data. the sensitivities of the two methods to the surface structure and the role of the resolution functions in the ctr measurements are discussed.
学科主题	半导体物理
收录类别	SCI
语种	英语
公开日期	2010-11-15
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/13957]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	CUI SF,LI JH,LI M,et al. DETERMINATION OF SURFACE-ROUGHNESS OF INP (001) WAFERS BY X-RAY-SCATTERING[J]. journal of applied physics,1994,76(7):4154-4158.
APA	CUI SF.,LI JH.,LI M.,LI CR.,GU YS.,...&ZHUANG Y.(1994).DETERMINATION OF SURFACE-ROUGHNESS OF INP (001) WAFERS BY X-RAY-SCATTERING.journal of applied physics,76(7),4154-4158.
MLA	CUI SF,et al."DETERMINATION OF SURFACE-ROUGHNESS OF INP (001) WAFERS BY X-RAY-SCATTERING".journal of applied physics 76.7(1994):4154-4158.