氩离子溅射刻蚀对Ti-Si-C纳米复合薄膜XPS分析的影响 | |
姜金龙1,2; 陈娣1; 王琼1; 杨华1; 魏智强1 | |
刊名 | 稀有金属材料与工程 |
2014 | |
卷号 | 43期号:4页码:977-981 |
关键词 | Ti-Si-C nanocomposite films Ar+ sputter-etching XPS bonding configurations |
ISSN号 | 1002-185X |
中文摘要 | 通过中频非平衡磁控溅射Ti80Si20复合靶在氩气和甲烷混合气氛中沉积Ti-Si-C复合薄膜。采用X射线衍射仪、Raman光谱和X射线光电子能谱分析薄膜微结构。结果显示:制备的薄膜为非晶碳(a-C:Si:H)包裹约10 nm TiC晶粒的复合结构,氩离子溅射刻蚀对XPS分析结果有显著影响。随氩离子刻蚀溅射刻蚀时间增加,薄膜表面C、O原子含量明显降低,而Ti、Si原子含量增加。氩离子溅射刻蚀导致薄膜非晶碳相发生石墨化转变,即sp3C-C(H)/sp2C-C比率减小,同时,C-Ti*/C-Ti和C-(Ti+Ti*)/C-C强度比明显增加。 |
英文摘要 | The Ti-Si-C nanocomposite film was deposited in gas mixtures of Ar and CH4 by middle frequency unbalanced magnetron sputtering Ti80Si20 composite targets. The microstructure of the film was investigated by X-ray diffraction, Raman spectrum and X-ray photoelectron spectroscopy. The results show that the film exhibits nc-TiC/a-C:Si:H nanocomposite structure with about 10 nm nanocrystallites TiC embedded in hydrocarbon (a-C:Si:H) matrix. The results of XPS analysis strongly depend on Ar+ sputter-etching. The C and O content on the film surface distinctly decreases, while the Ti and Si content gradually increase with the increasing of Ar+ sputter-etching time. It is found that Ar+ sputter-etching results in the graphitization of the amorphous carbon phase in the nanocomposite film. In other words, the sp3C-C(H)/sp2C-C ratio decreases with the increasing of Ar+ sputter-etching time. In addition, the C-Ti*/C-Ti and C-(Ti+Ti*)/C-C ratios obviously increase. |
学科主题 | 材料科学与物理化学 |
收录类别 | SCI&CSCD |
资助信息 | 国家自然科学基金资助(5110586) |
语种 | 中文 |
WOS记录号 | WOS:000335487800043 |
内容类型 | 期刊论文 |
源URL | [http://210.77.64.217/handle/362003/18301] |
专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
作者单位 | 1.兰州理工大学 2.中国科学研究院兰州化学物理研究所固体润滑国家重点实验室 |
推荐引用方式 GB/T 7714 | 姜金龙,陈娣,王琼,等. 氩离子溅射刻蚀对Ti-Si-C纳米复合薄膜XPS分析的影响[J]. 稀有金属材料与工程,2014,43(4):977-981. |
APA | 姜金龙,陈娣,王琼,杨华,&魏智强.(2014).氩离子溅射刻蚀对Ti-Si-C纳米复合薄膜XPS分析的影响.稀有金属材料与工程,43(4),977-981. |
MLA | 姜金龙,et al."氩离子溅射刻蚀对Ti-Si-C纳米复合薄膜XPS分析的影响".稀有金属材料与工程 43.4(2014):977-981. |
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